4³â ¿¬¼Ó º£½ºÆ®¼¿·¯ 1À§!
¹ÝµµÃ¼ ÁÖ¿ä Àåºñȸ»ç ±âÃâ¹®Á¦ Ãß°¡·Î ´õ¿í °·ÂÇÏ°Ô ¸®´º¾óµÈ ÃÖ½ÅÆÇ Ãâ°£!
ÃֽŠ8°³³â ¹ÝµµÃ¼ ÁÖ¿ä 8´ë ±â¾÷º° Àü°ø¸éÁ¢ ±âÃâ 1,920¹®Á¦ ºÐ¼®!
¼ÒÀÚ, 8´ë °øÁ¤, Å×½ºÆ® ¹× ÆÐŰ¡, Àåºñ 225¹®Á¦ ¹× ¸ð¹ü´ä¾È ¼ö·Ï!
¡ºÇѱÇÀ¸·Î ³¡³»´Â Àü°ø¡¤Á÷¹« ¸éÁ¢ ¹ÝµµÃ¼ ±âÃâÆí ÃÖ½ÅÆÇ¡»Àº ÀÌ°ø°è ÁÖ¿ä »ê¾÷ÀÇ Á÷¹«/Àü°ø ÀÌ·ÐÀ» ¡®¸éÁ¢ ´äº¯ Áغñ¡¯¶ó´Â ¸ñÀû¿¡ ¸ÂÃç ±¸¼ºÇÑ [ÇѱÇÀ¸·Î ³¡³»´Â Àü°ø¡¤Á÷¹« ¸éÁ¢] ½Ã¸®ÁîÀÇ ´ëÇ¥ µµ¼·Î, Àü°ø¡¤Á÷¹« ¸éÁ¢À» ¾ÕµÐ ¼öÇè»ýµéÀÌ ´Ü±â°£¿¡ È¿À²ÀûÀ¸·Î ÇнÀÇÒ ¼ö ÀÖµµ·Ï ³»¿ëÀ» ±¸¼ºÇÏ¿´´Ù.
2016³âºÎÅÍ 2023³â±îÁö ÃֽŠ8³â °£ÀÇ »ï¼º/SKÇÏÀ̴нº µî ¹ÝµµÃ¼ ±â¾÷ ½ÇÁ¦ ¸éÁ¢Áú¹®À» ½Ç¹« ¸éÁ¢°ü Ãâ½Å Àü/ÇöÁ÷ ¿£Áö´Ï¾î¿Í ÇÔ²² ºÐ¼®ÇÏ¿´À¸¸ç, Á÷¹«º° ´ëÇ¥ ±âÃâ¹®Á¦ 225°³¸¦ ¼±º°ÇÏ¿© ¸ð¹ü´ä¾ÈÀ» Á¤¸®ÇÏ¿´´Ù. ƯÈ÷ ¹ÝµµÃ¼ Àåºñ»çÀÇ Ãë¾÷À» Èñ¸ÁÇÏ´Â Ãë¾÷Áغñ»ýÀÌ ´Ã¾î³ª´Â °æÇâ¿¡ ¸ÂÃç ÁÖ¿ä Àåºñ»ç 6°³(¾îÇöóÀÌµå ¸ÓƼ¾î¸®¾óÁî/ASML/TEL(µµÄìÀÏ·ºÆ®·Ð)/·¥¸®¼Ä¡/¼¼¸Þ½º/¿øÀÍIPS)ÀÇ ±âÃâ ¹®Á¦¸¦ Ãß°¡ÇÏ¿© ¹ÝµµÃ¼ Ãë¾÷ ½ÃÀåÀÇ Æ®·»µå¸¦ ¹Ý¿µÇÏ¿´´Ù.
¶ÇÇÑ, [3´Ü°è ´äº¯ ±¸Á¶È]¸¦ ¼ö·ÏÇÏ¿© ±¸Á¶ÈµÈ ³»¿ëÀ» Åä´ë·Î º»ÀÎÀÌ »ý°¢ÇÏ´Â ´ä¾ÈÀ» ¸ÕÀú ÀÛ¼ºÇÑ µÚ ¸ð¹ü´ä¾È°ú ºñ±³ÇÏ¸é¼ ºÎÁ·ÇÑ ³»¿ë¸¸ Ãß°¡·Î ÇнÀÇÏ´Â ¹æ¹ýµµ °¡´ÉÇϸç, ¸éÁ¢À» ÁغñÇÏ°í ÀÖÀ¸³ª ÀÌ·Ð Á¤¸®°¡ ºÎÁ·ÇÏ´Ù°í »ý°¢ÇÏ´Â Ãë¾÷Áغñ»ýÀ» À§ÇØ, ¸éÁ¢ ´äº¯ Áغñ¸¦ À§ÇØ ¹Ýµå½Ã ÀÍÇô¾ß ÇÏ´Â ÇÙ½ÉÀ̷и¸ Á¤¸®ÇÏ¿© Çѱǿ¡ ¼ö·ÏÇÏ¿´´Ù.
Ãë¾÷¾ÆÄ«µ¥¹Ì ·¿À¯ÀÎÀº Since 2013³âºÎÅÍ ½ÃÀÛÇÏ¿© "÷´Ü±â¼úÁö½ÄÀÇ ´ëÁßȸ¦ ¼±µµÇÏ´Â ±â¾÷À¸·Î½á ÷´Ü±â¼ú Á¤º¸, Áö½ÄÀ» ½±°í ºü¸£°Ô Àü´ÞÇÏ¿©, »çȸ ±¸¼º¿ø°£ Á¤º¸ÀÇ ºñ´ëĪÀ» ÇؼÒÇÏ°í ±â¼ú °øÇÐºÐ¾ß Àü¹®Áö½ÄÀÇ ´ëÁßȸ¦ À̲ô´Â 1µî ±â¾÷ÀÌ µÈ´Ù!"¶ó´Â »ç¸íÀ» °¡Áö°í ¿î¿µÇÏ°í ÀÖÀ¸¸ç ±¹³» ¹ÝµµÃ¼, µð½ºÇ÷¹ÀÌ, ÀÚµ¿Â÷ »ê¾÷ÀÇ ÁÖ¿ä ±â¾÷ 1,500¿© °³ ±â¾÷À» ´ë»óÀ¸·Î 49,356¸íÀÇ ÀçÁ÷ÀÚ(´©Àû)µé¿¡°Ô Á÷¹«±³À°À» Á¦°øÇÏ°í ÀÖ´Ù. ·¿À¯ÀÎÀº »ï¼ºÀüÀÚ/µð½ºÇ÷¹ÀÌ, LGµð½ºÇ÷¹ÀÌ, SKÇÏÀ̴нº µî ÁÖ¿ä ´ë±â¾÷À» Æ÷ÇÔÇÏ¿© ´©Àû ÇÕ°Ý»ý 7,374¸íÀÇ ÇÕ°ÝÀÚ¸¦ ¹èÃâÇÏ¿´´Ù.
PART 1 ¹ÝµµÃ¼ ¼ÒÀÚ
Chapter 1 ¿¡³ÊÁö ¹êµå¿Í ¹ÝµµÃ¼ ¼ÒÀç
Chapter 2 PN Á¢ÇÕ(Junction)
Chapter 3 MOSFET
Chapter 4 MOSFETÀÇ ¹Ì¼¼È¿Í Short Channel Effect
Chapter 5 MOSFET ¿ä¼Ò ±â¼ú
Chapter 6 DRAM
Chapter 7 NAND Flash
Chapter 8 ¸Þ¸ð¸® ºñ±³¿Í Â÷¼¼´ë ¸Þ¸ð¸®
PART 2 ¹ÝµµÃ¼ °øÁ¤
Chapter 1 °øÁ¤ ±âÃÊ
Chapter 2 ÇöóÁ ±âÃÊ
Chapter 3 Æ÷Åä °øÁ¤(Photolithography)
Chapter 4 ½Ä°¢ °øÁ¤(Etch)
Chapter 5 ¹Ú¸· °øÁ¤(Thin film)
Chapter 6 ±Ý¼Ó ¹è¼± °øÁ¤(Metallization)
Chapter 7 »êÈ °øÁ¤(Oxidation)
Chapter 8 ÀÌ¿ÂÁÖÀÔ °øÁ¤(Ion Implantation)
Chapter 9 CMP °øÁ¤(CMP, Chemical-Mechanical Polishing)
Chapter 10 ¼¼Á¤ °øÁ¤(Cleaning)
PART 3 ¹ÝµµÃ¼ Å×½ºÆ® ¹× ÆÐŰ¡ °øÁ¤
Chapter 1 ¹ÝµµÃ¼ Å×½ºÆ® °øÁ¤
Chapter 2 ¹ÝµµÃ¼ ÆÐŰ¡ °øÁ¤
PART 4 ¹ÝµµÃ¼ Àåºñ
Chapter 1 ¾îÇöóÀÌµå ¸ÓƼ¾î¸®¾óÁî
Chapter 2 ASML
Chapter 3 TEL(µµÄìÀÏ·ºÆ®·Ð)
Chapter 4 ·¥¸®¼Ä¡
Chapter 5 ¼¼¸Þ½º
Chapter 6 ¿øÀÍIPS